Entegris and JSR Corporation/Inpria Corporation Announce Non-Exclusive Cross-Licensing to EUV Lithography
“As the industry moves to smaller nodes, materials innovation, performance, purity, and reliability become inseparable,” said
Under the agreement, Entegris and Inpria will cross-license metal oxide resist (MOR) patents, terminate current Inter Partes Review challenges (IPR2025-00267), and explore collaborative opportunities on future photoresist materials. The work is intended to span resist formulation, precursor synthesis and development, and possibly ultra-clean MOR-specific filtration along with associated delivery systems needed to ensure these new materials perform consistently in high-volume manufacturing for EUV lithography applications.
By combining JSR and Inpria’s collective leadership in metal oxide resist materials with Entegris’ expertise in MOR precursors for CVD deposition, materials handling, and advanced MOR-specific filtration, the collaboration supports the application of advanced materials in semiconductor manufacturing as both parties scale advanced technologies for the AI era.
"Pairing Inpria’s metal oxide resist innovation with Entegris’ purification and materials handling capabilities broadens the applicability of these technologies within the semiconductor materials ecosystem," said
About Entegris
Entegris is a leading supplier of advanced materials and process solutions for the semiconductor and other high-tech industries. Entegris has approximately 7,700 employees throughout its global operations and is ISO 9001 certified. It has manufacturing, customer service and/or research facilities in
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