Lam Research and JSR Corporation/Inpria Corporation Enter Cross-Licensing, Collaboration Agreement to Advance Semiconductor Manufacturing
Companies to Focus on Patterning for Leading-Edge Chips, Including Dry Resist EUV Lithography and Next-Generation Materials
The agreement capitalizes on JSR group's innovative semiconductor materials, including metal oxide solutions, and Lam's deep capabilities in deposition, etch, and EUV patterning, including Aether®, Lam's groundbreaking dry resist equipment and process technology that reduces the cost and complexity of creating the intricate patterns required for chips for artificial intelligence (AI) and high-performance computing (HPC).
The companies will collaborate to integrate JSR/Inpria's patterning resists and films with Lam's etch and dry resist deposition technologies. Lam and JSR/Inpria will also work together to expand innovation in several areas to support chipmakers as they scale in the AI era, including research and development related to metal oxide resists, high NA EUV patterning for advanced nodes, and other advanced films for next-generation patterning. In addition, leveraging JSR's recent acquisition of
"By richly complementing Lam's proven atomic layer deposition and etch capabilities with JSR's deep expertise in advanced patterning materials, this collaboration enables us to accelerate innovation at a time of rising semiconductor complexity," said
"At JSR, we are committed to advancing cutting-edge materials to enable our customers' most demanding technology roadmaps," said
Lam and Inpria have also agreed to dismiss all claims against each other in the litigation Inpria v.
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Caution Regarding Forward-Looking Statements:
Statements made in this press release that are not of historical fact are forward-looking statements and are subject to the safe harbor provisions created by the Private Securities Litigation Reform Act of 1995. These forward-looking statements are based on Lam's and JSR's current expectations, their respective managements' beliefs, and certain assumptions made by Lam and JSR, all of which are subject to change. Forward-looking statements can often be identified by words such as "likely," "plan," "believe," "will," "may," "if," similar expressions, and variations or negatives of these words. Examples of such forward-looking statements include, but are not limited to, statements in this press release regarding (i) the collaboration between Lam and JSR, (ii) Lam's and JSR's expectations regarding the benefits of the cross-licensing and collaboration agreement, (iii) industry and trends and future technology requirements, (iv) the capabilities of Lam's and JSR's products and technology, and (v) the dismissal of litigation. There are a number of important factors that could cause actual results or events to differ materially from those indicated by such forward-looking statements, including: Lam and JSR may not receive the expected benefits of the cross-licensing and collaboration agreement; court approvals required for the dismissal of litigation may not be obtained, or are obtained subject to conditions that are not anticipated; business, economic, political and/or regulatory conditions in the industry and the overall economy may deteriorate or change; the actions of Lam's and JSR's customers and competitors may be inconsistent with Lam's and JSR's expectations; trade regulations, export controls, tariffs, trade disputes, and other geopolitical tensions may inhibit Lam's and JSR's ability to sell their products; as well as the other risks and uncertainties that are described in the documents filed or furnished by Lam with the Securities and Exchange Commission, including specifically the Risk Factors described in Lam's annual report on Form 10-K for the fiscal year ended June 29, 2025. These uncertainties and changes could materially affect the forward-looking statements and cause actual results to vary from expectations in a material way. Lam and JSR undertake no obligation to update the information or statements made in this press release.
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Lam Research Contacts:
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e-mail: litho_semi@jsr.co.jp
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